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Journal paper
Date of publication2007-04-00
Journal levelSCI
Paper title (chapter)Efficient Mobility Enhancement Engineering on 65nm Fully Silicide complementary MOSFET Using Second Contact Etch Stop Layer Process
Name of journalJapanese Journal of Applied Physics
number of chapters46
Issue No.4B
起頁2127
迄頁2130
Total number of pages4
Name of author (Chinese)Wen-Kuan Yeh
Name of author (English)Wen-Kuan Yeh
AuthorsChieh-Ming Lai, Yean-Kuen Fang, Chien-Ting Lin, and Wen-Kuan Yeh
Number of authors4
Author's typeCorresponding Author
Language usedEnglish

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