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Journal paper
Date of publication2006-04-00
Journal levelSCI
Paper title (chapter)Stress Technology Impact on Device Performance and Reliability for <100> sub-90nm SOI CMOSFETs
Name of journalJapanese Journal of Applied Physics
number of chapters45
Issue No.4B
起頁3053
迄頁3057
Total number of pages5
Name of author (Chinese)Wen-Kuan Yeh
Name of author (English)Wen-Kuan Yeh
AuthorsChieh-Ming Lai, Yean-Kuen Fang, Wen-Kuan Yeh, S. H. Chen, and Ta-Hsun Yeh
Number of authors5
Author's typeCorresponding Author
Language usedEnglish

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