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Journal paper
Date of publication2011-03-00
Journal levelSCI / EI
Paper title (chapter)Impact of SOI Thickness on FUSI-Gate CESL CMOS Performance and Reliability
Name of journalIEEE Transactions on Device and Materials Reliability
number of chapters11
Issue No.1
起頁44
迄頁49
Total number of pages6
Name of author (Chinese)Wen-Kuan Yeh
Name of author (English)Wen-Kuan Yeh
AuthorsYu-Ting Chen, K.-M. Chen, Wen-Kuan Yeh, C.-C. Wang, C-L. Lin, J.-S. Yuan, and F.-S. Yeh
Number of authors7
Author's typeOther
Reference URLhttp://ieeexplore.ieee.org/search/freesrchabstract.jsp?tp=&arnumber=5560782&queryText%3DImpact+of+SOI+Thickness+on+FUSI-Gate+CESL+CMOS+Performance+and+Reliability%26openedRefinements%3D*%26searchField%3DSearch+All
Language usedEnglish

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