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Seminar paper
Year2008
Paper type受邀演講
Paper level其他
Paper title (chapter)The Impact of Strain Technology on Device Characteristic and Reliability for FUSI Gate SOI CMOSFET and Device Performance Enhancement for 45nm node
Name of conferenceICSICTS
Conference starting time2008-10-00
Conference closing time2008-10-00
Name of author (Chinese)Wen-Kuan Yeh
Name of author (English)Wen-Kuan Yeh
AuthorsWen-Kuan Yeh, Jean-An Wang , Chien-Ting Lin, Li-Wei Cheng, Mike Ma
Number of authors5
Author's typeFirst Author
LocationBeijing, China
Language usedEnglish

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