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Seminar paper
Year2011
Paper type口頭報告 / 會議論文
Paper levelEI
Paper title (chapter)A Proposed High Manufacturability Strain Technology for High-k/Metal Gate SiGe-SOI CMOSFET
Name of conference2011 IEEE International SOI Conference
Conference starting time2011-10-03
Conference closing time2011-10-06
Name of author (Chinese)Wen-Kuan Yeh
Name of author (English)Wen-Kuan Yeh
AuthorsW.K. Yeh, C. Y. Cheng(鄭濟允), Y. L Yang, C.T. Lin , C.M. Lai, Y.W.Chen, C. H. Hsu, C. W. Yang, and P. Y. Chen
Number of authors9
Author's typeFirst Author / Corresponding Author
LocationTempe, Arizona, USA
Language usedEnglish

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