:::
Year | 2013 |
---|---|
Paper type | 口頭報告 / 會議論文 |
Paper level | 其他 |
Paper title (chapter) | Reliability of Doping Concentration in Ultra-Thin-Body and Buried Oxide Silicon on Insulator |
Name of conference | International Electron Devices and Materials Symposium (IEDMS) |
Conference starting time | 2013-11-28 |
Conference closing time | 2013-11-29 |
Name of author (Chinese) | Wen-Teng Chang |
Name of author (English) | Wen-Teng Chang |
Authors | Wen-Teng Chang, Chun-Ming Lai, and Wen-Kuan Yeh |
Number of authors | 3 |
Author's type | First Author / Corresponding Author |
Location | Nantou, Taiwan |