Effects of Doping Ratio and Thermal Annealing on Structural and Electrical Properties of Boron-Doped ZnO Thin Films by Spray Pyrolysis
- 出版日期：2013-06-25
- 期刊等級：SCI
- 論文名稱(篇名)：Effects of Doping Ratio and Thermal Annealing on Structural and Electrical Properties of Boron-Doped ZnO Thin Films by Spray Pyrolysis
- 期刊名：Japan Journal of Applied Physics
- 卷數：52
- 期數：6
- 起頁：065502
- 迄頁：065502-5
- 總頁數：
- 作者中文名：施明昌
- 作者英文名：Ming-Chang Shih
- 全部作者：Cheng-Chang Yu, Yu-Ting Hsu, Shao-Yi Lee, Wen-How Lan,Hsin-Hui Kuo, Ming-Chang Shih, Jui-Yang Feng, Kai-Feng Huang
- 著作人數：8
- 作者型態：other
- 使用語言：
