"A Si–based bulk FinFET by novel etching process with mask–less and photoresist–free lithography technique" , International Journal of Nanotechnology , 12 , 1/2 , pp87-89 ,2015, (SCI)

  • 出版日期：2015-06-00
  • 期刊等級：SCI
  • 論文名稱(篇名)：A Si–based bulk FinFET by novel etching process with mask–less and photoresist–free lithography technique
  • 期刊名：International Journal of Nanotechnology
  • 卷數：12
  • 期數：1/2
  • 起頁：1/2
  • 迄頁：89
  • 作者中文名：葉文冠
  • 作者英文名：Wen-Kuan Yeh
  • 全部作者：Min–Cheng Chen, Chih–Ming Wu, Yun–Fang Hou, Yi–Ju Chen, Chang–Hsien Lin, Chia–Yi Lin, Bo–Wei Wu, Wen–Kuan Yeh
  • 著作人數：8
  • 作者型態：Corresponding Author