"Significant Improvement of 45nm and Beyond Complementary Metal Oxide Semiconductor Field Effect Transistor Performance with Fully Silicided and Ultimate Spacer Process Technology" , Thin Solid Films , 516 , 21 , pp7741-7743 ,2008, (SCI)

  • 出版日期：2008-09-00
  • 期刊等級：SCI
  • 論文名稱(篇名)：Significant Improvement of 45nm and Beyond Complementary Metal Oxide Semiconductor Field Effect Transistor Performance with Fully Silicided and Ultimate Spacer Process Technology
  • 期刊名：Thin Solid Films
  • 卷數：516
  • 期數：21
  • 起頁：7741
  • 迄頁：7744
  • 總頁數：3
  • 作者中文名：葉文冠
  • 作者英文名：Wen-Kuan Yeh
  • 全部作者：Chia-Wei Hsu, Yean-Kuen Fang, Chien-Ting Lin, Wen-Kuan Yeh, Che-Hua Hsu ,Chieh-Ming Lai, Li-Wei Cheng, and Mike Ma
  • 著作人數：8
  • 作者型態：Corresponding Author
  • 使用語言：英文