"A Comprehensive Study of Polymorphic Phase Distribution of Ferroelectric-Dielectrics and Interfacial Layer Effects on Negative Capacitance FETs for Sub-5 nm Node",International Symposium on VLSI Technology and Circuits (VLSI Symposium),USA, (SCI)

  • 年度：2018
  • 論文類型：會議論文
  • 論文等級：SCI
  • 論文名稱(篇名)：A Comprehensive Study of Polymorphic Phase Distribution of Ferroelectric-Dielectrics and Interfacial Layer Effects on Negative Capacitance FETs for Sub-5 nm Node
  • 會議名稱：International Symposium on VLSI Technology and Circuits (VLSI Symposium)
  • 作者中文名：葉文冠
  • 作者英文名：Wen-Kuan Yeh
  • 全部作者：International Symposium on VLSI Technology and Circuits (VLSI Symposium)
  • 著作人數：15
  • 作者型態：Other
  • 會議地點：Japan