"A Short-Channel-Effect-Degraded Noise Margin Model for Junctionless Double-Gate MOSFET Working on Subthreshold CMOS Logic Gates" , IEEE Trans on Electron Device (TED) , 63 , 8 , pp3354-3359 ,2016, (SCI)
出版日期:2016-07-00
期刊等級:SCI
論文名稱(篇名):A Short-Channel-Effect-Degraded Noise Margin Model for Junctionless Double-Gate MOSFET Working on Subthreshold CMOS Logic Gates
期刊名:IEEE Trans on Electron Device (TED)
卷數:63
期數:8
起頁:3354
迄頁:3359
總頁數:6
作者中文名:江德光
作者英文名:Te-Kung Chiang
全部作者:Chiang Te-Kuang
著作人數:1
作者型態:Corresponding Author
使用語言:英文