計畫名稱：銦鉍共摻型氧化鋅膜之電性與光催化特性研究
執行起迄：2014/08/01~2015/07/31
總核定金額：715,000元
中文摘要：本計畫研究銦鉍共摻雜氧化鋅的特性。透過在藍寶石與矽基板上，進行相同沉積參數的銦鉍共摻的氧化鋅薄膜製作。分析其表面形貌，晶體品質，以及濃度，漂移率等特性。在藍寶石基板與矽基板上，沉積出的薄膜表面形貌不同。在結構上，主要為氧化鋅的(002)與(101)晶向。隨著沉積前驅物中的銦成分增加，在藍寶石基板上， (101)晶向成為主要訊號；而在矽基板上，則 (002)晶向成為主要訊號。而不論在何種基板上,所有的薄膜均為p型，在矽基板上的薄膜有較高的濃度與較低的電阻率。隨著銦成分增加，其薄膜濃度呈現遞增，而漂移率亦有所變化。薄膜於室溫下貯存四個月，其薄膜濃度均呈現微增加情形，在矽基板上有較高的增加量。在光催化能力上，薄膜於紫外光下可對水溶液中的甲基橙進行分解，在矽基板上沉積的薄膜有較佳的分解效果。而二種薄膜在逐次使用後均呈現遞減的情況。同時經過貯存二週的樣品，其分解能力呈現更下降的趨勢。
英文摘要：The indium and bismuth codoped zinc oxide films were deposited on c-sapphire substrate and n-silicon (111) substrate by spray pyrolysis with same deposition parameters. The surface morphology, crystalline quality, carrier concentration and mobility were characterized. The textured structure with different morphology and mainly (002) and (101) orientations can be observed for all samples. With the increasing of indium content in precursor, dominated (101) and (002) signal can be observed for the films deposited on c-sapphire and n-silicon substrate, respectively. The concentration increases and mobility varies with the increasing of indium content in precursor and more concentration increment can be observed for the film deposited on silicon substrate. The film concentration increases after preserved for four month. The decomposition ability of methyl orange aqueous solution under ultra-violate light for the films was studied. The film deposited on n-silicon substrate show better decomposition ability. And the deposition ability for both samples decreases after the cyclic experiment. For the samples preserved for two weeks, the worst deposition ability can be observed.