The Effects of Acetone as the Co-solvent mixed with HF-etchant in Supercritical CO2 for Etching Lift-off SOI-based Si-nanomembranes

David Jui-Yang Feng* and Jiun-Kai Hsu, “The Effects of Acetone as the Co-solvent mixed with HF-etchant in Supercritical CO2 for Etching Lift-off SOI-based Si-nanomembranes,” International Electron Devices & Materials Symposium (IEDMS2020), Taoyuan, Taiwan, Oct. 15 – 16, 2020