Demonstration of using HF-etchant mixed into CO2 to lift-off thin-film GaAs layer by supercritical fluids technology
David Jui-Yang Feng*, Heng Kuo, and Cheng-Fu Yang*, “Demonstration of using HF-etchant mixed into CO2 to lift-off thin-film GaAs layer by supercritical fluids technology,” Modern Physics Letters B, Vol. xx, No. x, 2141018 Dec. 14 (2021)