Wen-Teng Chang, Tsung-Lun Tsou(鄒宗倫), Tzu Hao, Lin(林子豪), “Effect of Stacked Work Function Metals on Gate Stress Reliability of N- and P-FinFETs,” IEEE Transactions on Electron Devices, 70, 8, 4062

Wen-Teng Chang, Tsung-Lun Tsou(鄒宗倫), Tzu Hao, Lin(林子豪), “Effect of Stacked Work Function Metals on Gate Stress Reliability of N- and P-FinFETs,” IEEE Transactions on Electron Devices, 70, 8, 4062 - 4066, 2023. (SCI)

Wen-Teng Chang, Tsung-Lun Tsou(鄒宗倫), Tzu Hao, Lin(林子豪), “Effect of Stacked Work Function Metals on Gate Stress Reliability of N- and P-FinFETs,” IEEE Transactions on Electron Devices, 70, 8, 4062 - 4066, 2023 SCI