"The Improvement of Reliability of 28nm High-k/Metal Gate Device with Various PMA Conditions",Symposium of Nano Device Technology, Hsinchu, Taiwan,2011/04/00
年度：2011
論文類型：海報展示
論文名稱(篇名)：The Improvement of Reliability of 28nm High-k/Metal Gate Device with Various PMA Conditions
會議名稱：Symposium of Nano Device Technology
會議開始時間：2011-04-00
會議結束時間：2011-04-00
作者中文名：葉文冠
作者英文名：Wen-Kuan Yeh
全部作者：Chi-Yun Cheng, Wen-Kuan Yeh, Yi-Lin Yang and Chia-Wei Hsu
