"A Proposed High Performance High-k/Metal Gate CMOSFET Process with Optimism Strained Si cap/SiGe p-channel and Relaxed SiGe n-channel",ICSICTS,Shanghai, China. ,2010/11/01-2010/11/03
年度：2010
論文類型：口頭報告 / 受邀演講
論文名稱(篇名)：A Proposed High Performance High-k/Metal Gate CMOSFET Process with Optimism Strained Si cap/SiGe p-channel and Relaxed SiGe n-channel
會議名稱：ICSICTS
會議開始時間：2010-11-01
會議結束時間：2010-11-03
作者中文名：葉文冠
作者英文名：Wen-Kuan Yeh
全部作者：Wen-Kuan Yeh, Jean-An Wang , Chien-Ting Lin, Li-Wei Cheng, Mike Ma
