"A New Analytical Subthreshold Behavior Model for Single-Halo Dual-Material Gate Silicon on Insulator Metal Oxide Semiconductor Field Effect Transistor" , Japanese Journal of Applied Physics , vol.47 , no.11 , pp8297-8304 ,2008, (SCI)
出版日期：2008-11-00
期刊等級：SCI
論文名稱(篇名)： A New Analytical Subthreshold Behavior Model for Single-Halo Dual-Material Gate Silicon on Insulator Metal Oxide Semiconductor Field Effect Transistor
期刊名：Japanese Journal of Applied Physics
卷數：vol. 47
期數：no.11
起頁：8297
迄頁：8304
作者中文名：江德光
作者英文名：Te-Kung Chiang
全部作者：T.K. Chiang
著作人數：1
作者型態：First Author / Corresponding Author
使用語言：英文
