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Mechanism Study of Etching Lift-off SOI-based Si-nanomembrane by using HF mixed into Supercritical CO2

David Jui-Yang Feng*, Jiun-Kai Hsu and Li-Wen Kuo, “Mechanism Study of Etching Lift-off SOI-based Si-nanomembrane by using HF mixed into Supercritical CO2,” Optics & Photonics Taiwan International Conference (OPTIC 2020), Taipei, Taiwan, Dec. 3 – 5, 2020.
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