Wen-How Lan,"Effects of Doping Ratio and Thermal Annealing on Structural and Electrical Properties of Boron-Doped ZnO Thin Films by Spray Pyrolysis" , Japanese Journal of Applied Physics , 52 , 1 , pp065502-1-065502-5 ,2013, (SCI)
出版日期 2013-05-29
期刊等級 SCI
論文名稱(篇名) Effects of Doping Ratio and Thermal Annealing on Structural and Electrical Properties of Boron-Doped ZnO Thin Films by Spray Pyrolysis
期刊名 Japanese Journal of Applied Physics
卷數 52
期數 1
起頁 065502-1
迄頁 065502-5
作者中文名 藍文厚
作者英文名 Wen-How Lan
全部作者 Cheng-Chang Yu, Yu-Ting Hsu, Shao-Yi Lee, Wen-How Lan, Hsin-Hui Kuo, Ming-Chang Shih, David Jui-Yang Feng, and Kai-Feng Huang
著作人數 8
作者型態 Corresponding Author
期刊等級 SCI
論文名稱(篇名) Effects of Doping Ratio and Thermal Annealing on Structural and Electrical Properties of Boron-Doped ZnO Thin Films by Spray Pyrolysis
期刊名 Japanese Journal of Applied Physics
卷數 52
期數 1
起頁 065502-1
迄頁 065502-5
作者中文名 藍文厚
作者英文名 Wen-How Lan
全部作者 Cheng-Chang Yu, Yu-Ting Hsu, Shao-Yi Lee, Wen-How Lan, Hsin-Hui Kuo, Ming-Chang Shih, David Jui-Yang Feng, and Kai-Feng Huang
著作人數 8
作者型態 Corresponding Author
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