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"Effects of Doping Ratio and Thermal Annealing on Structural and Electrical Properties of Boron-Doped ZnO Thin Films by Spray Pyrolysis" , Japanese Journal of Applied Physics , 52 , 52 , pp065502-1-065502-5 ,2013, (SCI)

  • 出版日期:2013-05-29
  • 期刊等級:SCI
  • 論文名稱(篇名): Effects of Doping Ratio and Thermal Annealing on Structural and Electrical Properties of Boron-Doped ZnO Thin Films by Spray Pyrolysis
  • 期刊名:Japanese Journal of Applied Physics
  • 卷數:52
  • 期數:52
  • 起頁:065502-1
  • 迄頁:065502-5
  • 總頁數:5
  • 作者中文名:馮瑞陽
  • 作者英文名:(David) Jui-Yang, Feng
  • 全部作者:Cheng-Chang Yu, Yu-Ting Hsu, Shao-Yi Lee, Wen-How Lan, Hsin-Hui Kuo, Ming-Chang Shih, David Jui-Yang Feng, and Kai-Feng Huang
  • 著作人數:8
  • 作者型態:Other
  • 參考網址:http://storagex.ipap.jp/pdfreprint/jjap/20130528/zTgh1z6/jjap-52-065502.pdf
  • 使用語言:英文
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