"A Si–based bulk FinFET by novel etching process with mask–less and photoresist–free lithography technique" , International Journal of Nanotechnology , 12 , 1/2 , pp87-89 ,2015, (SCI)

出版日期：2015-06-00

期刊等級：SCI

論文名稱(篇名)：A Si–based bulk FinFET by novel etching process with mask–less and photoresist–free lithography technique

期刊名：International Journal of Nanotechnology

卷數：12

期數：1/2

起頁：1/2

迄頁：89

作者中文名：葉文冠

作者英文名：Wen-Kuan Yeh

全部作者：Min–Cheng Chen, Chih–Ming Wu, Yun–Fang Hou, Yi–Ju Chen, Chang–Hsien Lin, Chia–Yi Lin, Bo–Wei Wu, Wen–Kuan Yeh

著作人數：8

作者型態：Corresponding Author

瀏覽數: