"The impact of interface/border defect on performance and reliability of high-k/metal-gate CMOSFET" , Microelectronics Reliability , 4 , 53 , pp265-269 ,2013, (SCI)

出版日期：2013-02-00

期刊等級：SCI

論文名稱(篇名)：The impact of interface/border defect on performance and reliability of high-k/metal-gate CMOSFET

期刊名：Microelectronics Reliability

卷數：4

期數：53

起頁：265

迄頁：269

總頁數：4

作者中文名：葉文冠

作者英文名：Wen-Kuan Yeh

全部作者：Wen-Kuan Yeh , Po-Ying Chen, Kwang-Jow Gan, Jer-Chyi Wang, Chao Sung Lai

著作人數：5

作者型態：Corresponding Author

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