"Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium" , IEEE ELECTRON DEVICE LETTERS, , 37 , 11 , pp1379-1381, ,2016, (SCI)
出版日期:2016-09-00
期刊等級:SCI
論文名稱(篇名):Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium