"Significant Improvement of 45nm and Beyond Complementary Metal Oxide Semiconductor Field Effect Transistor Performance with Fully Silicided and Ultimate Spacer Process Technology" , Thin Solid Films , 516 , 21 , pp7741-7743 ,2008, (SCI)
出版日期：2008-09-00
期刊等級：SCI
論文名稱(篇名)：Significant Improvement of 45nm and Beyond Complementary Metal Oxide Semiconductor Field Effect Transistor Performance with Fully Silicided and Ultimate Spacer Process Technology
期刊名：Thin Solid Films
卷數：516
期數：21
起頁：7741
迄頁：7744
總頁數：3
作者中文名：葉文冠
作者英文名：Wen-Kuan Yeh
全部作者：Chia-Wei Hsu, Yean-Kuen Fang, Chien-Ting Lin, Wen-Kuan Yeh, Che-Hua Hsu ,Chieh-Ming Lai, Li-Wei Cheng, and Mike Ma
