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"A Comprehensive Study of Polymorphic Phase Distribution of Ferroelectric-Dielectrics and Interfacial Layer Effects on Negative Capacitance FETs for Sub-5 nm Node",International Symposium on VLSI Technology and Circuits (VLSI Symposium),USA, (SCI)

  • 年度:2018
  • 論文類型:會議論文
  • 論文等級:SCI
  • 論文名稱(篇名):A Comprehensive Study of Polymorphic Phase Distribution of Ferroelectric-Dielectrics and Interfacial Layer Effects on Negative Capacitance FETs for Sub-5 nm Node
  • 會議名稱:International Symposium on VLSI Technology and Circuits (VLSI Symposium)
  • 作者中文名:葉文冠
  • 作者英文名:Wen-Kuan Yeh
  • 全部作者:International Symposium on VLSI Technology and Circuits (VLSI Symposium)
  • 著作人數:15
  • 作者型態:Other
  • 會議地點:Japan
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