"The Impact of Strain Technology on Device Characteristic and Reliability for FUSI Gate SOI CMOSFET and Device Performance Enhancement for 45nm node",ICSICTS,Beijing, China,2008/10/00 (其他)
年度：2008
論文類型：受邀演講
論文等級：其他
論文名稱(篇名)：The Impact of Strain Technology on Device Characteristic and Reliability for FUSI Gate SOI CMOSFET and Device Performance Enhancement for 45nm node
會議名稱：ICSICTS
會議開始時間：2008-10-00
會議結束時間：2008-10-00
作者中文名：葉文冠
作者英文名：Wen-Kuan Yeh
全部作者：Wen-Kuan Yeh, Jean-An Wang , Chien-Ting Lin, Li-Wei Cheng, Mike Ma
